RMS Launches Risk Intelligence Platform for The Risk Market
The new platform for risk management and selection includes Advanced Risk Model Exeuction Services, a Risk Data Lake, analytics with modular REST APIs, and intuitive applications.
The new platform for risk management and selection includes Advanced Risk Model Exeuction Services, a Risk Data Lake, analytics with modular REST APIs, and intuitive applications.
Apps created through the unique development network extend the range of risk management capabilities available to users of RMS(one), which RMS describes as the industry’s first and only real-time exposure and risk management environment.
Location Intelligence API and SiteIQ, employ RMS models and rich data layers built into the vendor’s Risk Intelligence platform.
RMS says its new exposure analytics solution has been developed to give firms a much clearer view of their risk accumulations to better manage volatility.
The insurance industry-funded research entity will apply RMS solutions to research into extreme weather and its effect on buildings.
The system provides insurers with the framework to organize and structure their data, in addition to five cyber loss models that enables insurers to stress test their portfolios against a range of cyber loss methods.
Sandler will be responsible for expanding the RMS business in cyber, data, underwriting and models solutions by bundling digital risk and underwriting transformation capabilities.
The model provides losses at different return periods for all major cyber loss processes, so insurers can allocate risk capital and design products reflecting the full nature of cyber risk.
White has served for over 25 years as an executive and investor in the technology industry, bringing technology, innovation, data and operations together to build and scale businesses.
The solution offers underwriters best-in-class hazard, risk and loss metrics from RMS model science at the location level, ensuring a consistent view of risk from underwriting up to portfolio management.